JPH0263535U - - Google Patents
Info
- Publication number
- JPH0263535U JPH0263535U JP14193188U JP14193188U JPH0263535U JP H0263535 U JPH0263535 U JP H0263535U JP 14193188 U JP14193188 U JP 14193188U JP 14193188 U JP14193188 U JP 14193188U JP H0263535 U JPH0263535 U JP H0263535U
- Authority
- JP
- Japan
- Prior art keywords
- end point
- detecting
- difference value
- point based
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001514 detection method Methods 0.000 claims description 3
- 238000000295 emission spectrum Methods 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims description 3
- 239000007795 chemical reaction product Substances 0.000 claims 1
- 238000012544 monitoring process Methods 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14193188U JPH0263535U (en]) | 1988-11-01 | 1988-11-01 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14193188U JPH0263535U (en]) | 1988-11-01 | 1988-11-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0263535U true JPH0263535U (en]) | 1990-05-11 |
Family
ID=31407437
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14193188U Pending JPH0263535U (en]) | 1988-11-01 | 1988-11-01 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0263535U (en]) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04229620A (ja) * | 1990-05-24 | 1992-08-19 | Applied Materials Inc | 多チャンネル・プラズマ放電終点検出システム及び方法 |
| JPH06229827A (ja) * | 1992-12-23 | 1994-08-19 | Internatl Business Mach Corp <Ibm> | プラズマ・エッチングの終了点検出装置及び方法 |
| JP2012156455A (ja) * | 2011-01-28 | 2012-08-16 | Japan Display Central Co Ltd | エッチング装置及びエッチング方法 |
-
1988
- 1988-11-01 JP JP14193188U patent/JPH0263535U/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04229620A (ja) * | 1990-05-24 | 1992-08-19 | Applied Materials Inc | 多チャンネル・プラズマ放電終点検出システム及び方法 |
| JPH06229827A (ja) * | 1992-12-23 | 1994-08-19 | Internatl Business Mach Corp <Ibm> | プラズマ・エッチングの終了点検出装置及び方法 |
| JP2012156455A (ja) * | 2011-01-28 | 2012-08-16 | Japan Display Central Co Ltd | エッチング装置及びエッチング方法 |
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